Uniformity analysis of wafer scale sub-25nm wide nanowire array nanoimprint mold fabricated by PEDAL process

Autor: Sonkusale, Sachin R. sachin.sonkusale@gmail.com, Di Spigna, Neil H.1, Franzon, Paul D.1
Zdroj: Microelectronic Engineering. May2007, Vol. 84 Issue 5-8, p1523-1527. 5p.
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