Effect of plasma treatment on the microstructure and electrical properties of MIM capacitors with PECVD silicon oxide and silicon nitride.
| Autor: | Chia-Cheng Ho1, Bi-Shiou Chiou1,2 bschiou@mail.nctu.edu.tw |
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| Zdroj: | Journal of Materials Science. Feb2007, Vol. 42 Issue 3, p941-947. 7p. 4 Black and White Photographs, 1 Chart, 8 Graphs. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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