Formation of polycrystalline SiGe thin films by the RF magnetron sputtering method with Ar–H2 mixture gases
| Autor: | Nakamura, Isao isaon@keyaki.cc.u-tokai.ac.jp, Ajiki, Toru1, Abe, Hirokazu1, Hoshi, Daisuke1, Isomura, Masao1 |
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| Zdroj: | Vacuum. May2006, Vol. 80 Issue 7, p712-715. 4p. |
| Databáze: | Academic Search Ultimate |
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