Correlation between a-C:H film properties and Ar/CH4 dielectric barrier discharge

Autor:	Bratescu, M.A.1 maria@plasma.numse.nagoya-u.ac.jp, Yoshizaki, Y.1, Suda, Y.1, Sakai, Y.1, Sugawara, H.1, Takai, O.2
Zdroj:	Thin Solid Films. May2006, Vol. 506-507, p145-149. 5p.
Databáze:	Academic Search Ultimate
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect