Numerical investigation of plasma properties in Ar/SiH4 inductively coupled plasmas considering electron energy distribution functions.
| Autor: | Kim, Ji-Hoon1 (AUTHOR), Yoon, Min-Young2 (AUTHOR), Kim, Gwan1 (AUTHOR), Kwon, Deuk-Chul3 (AUTHOR), Lee, Hyo-Chang1 (AUTHOR), Kim, Jung-Hyung2 (AUTHOR), Choe, Hee-Hwan1 (AUTHOR) choehh@kau.ac.kr |
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| Zdroj: | Journal of Applied Physics. 9/7/2024, Vol. 136 Issue 9, p1-16. 16p. |
| Databáze: | Academic Search Ultimate |
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