Sensitivity-Enhancing Modified Holographic Photopolymer of PQ/PMMA.

Autor: Wu, Junhui1 (AUTHOR) junhuifjnu@foxmail.com, Jin, Junchao1 (AUTHOR) qbx20210097@yjs.fjnu.edu.cn, Hu, Po2 (AUTHOR) hupo_lzu_13@163.com, Li, Jinhong1 (AUTHOR) ljh0401_fjnu@163.com, Zeng, Zeyi1 (AUTHOR) zzy947633474@foxmail.com, Li, Qingdong1 (AUTHOR) lee1735512161@foxmail.com, Liu, Jie1 (AUTHOR) liujie_2120@163.com, Chen, Mingyong1 (AUTHOR) mingychen@foxmail.com, Zhang, Zuoyu1 (AUTHOR) fjunnin9@163.com, Wang, Li1 (AUTHOR) li18937012859@163.com, Lin, Xiao3 (AUTHOR) xiaolin@fjnu.edu.cn, Tan, Xiaodi3 (AUTHOR) xiaolin@fjnu.edu.cn
Zdroj: Polymers (20734360). Jun2024, Vol. 16 Issue 11, p1484. 15p.
Databáze: Academic Search Ultimate
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