Enhancing Si 3 N 4 Selectivity over SiO 2 in Low-RF Power NF 3 –O 2 Reactive Ion Etching: The Effect of NO Surface Reaction.

Autor: Tung, Nguyen Hoang1,2 (AUTHOR) hslee89@kimm.re.kr, Lee, Heesoo2 (AUTHOR) geonous0319@kimm.re.kr, Dinh, Duy Khoe3 (AUTHOR) khoedd@gmail.com, Kim, Dae-Woong1,2 (AUTHOR) dwkim@kimm.re.kr, Lee, Jin Young4 (AUTHOR) ljycj12@kimm.re.kr, Eom, Geon Woong2,5 (AUTHOR), Kim, Hyeong-U2,6 (AUTHOR), Kang, Woo Seok1,2 (AUTHOR) kang@kimm.re.kr
Zdroj: Sensors (14248220). May2024, Vol. 24 Issue 10, p3089. 12p.
Databáze: Academic Search Ultimate
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