Low temperature sputtering deposition of Al1−xScxN thin films: Physical, chemical, and piezoelectric properties evolution by tuning the nitrogen flux in (Ar + N2) reactive atmosphere.

Autor:	Signore, M. A.1 (AUTHOR), Serra, A.2,3 (AUTHOR), Manno, D.2,3 (AUTHOR), Quarta, G.2,3 (AUTHOR), Calcagnile, L.2,3 (AUTHOR), Maruccio, L.2,3 (AUTHOR), Sciurti, E.1 (AUTHOR), Melissano, E.1 (AUTHOR), Campa, A.1 (AUTHOR), Martucci, M. C.1 (AUTHOR), Francioso, L.1 (AUTHOR), Velardi, L.1 (AUTHOR) luciano.velardi@cnr.it
Zdroj:	Journal of Applied Physics. 3/28/2024, Vol. 135 Issue 12, p1-11. 11p.
Databáze:	Academic Search Ultimate
Externí odkaz:	Zobrazit plný text záznamu