Pulsed reactive chemical vapor deposition in the C-Ti-Si system from H2/TiCl4/SiCl4
| Autor: | Jacques, S. sylvain.jacques@adm.univ-lyon1.fr, Di-Murro, H.1, Berthet, M.-P.1, Vincent, H.1 |
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| Zdroj: | Thin Solid Films. May2005, Vol. 478 Issue 1/2, p13-20. 8p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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