Physical properties of HfO2 nano structures deposited using PLD.
| Autor: | Salim, Evan T.1 evan_tarq@yahoo.com, Hassan, Ahmed T.2, Mahdi, Rana O.1, Alsultany, Forat H.3 |
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| Zdroj: | International Journal of Nanoelectronics & Materials. Jul2023, Vol. 16 Issue 3, p495-510. 16p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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