Characterization and dressing effect of CMP diamond disc conditioner with ordered abrasive distribution.

Autor: Guo, Zhaozhi1 (AUTHOR), Yang, Songhao1 (AUTHOR), Wen, Zhenhui1 (AUTHOR), Li, Jingyu1 (AUTHOR), Cheng, Jun1 (AUTHOR) jcheng@mail.neu.edu.cn
Zdroj: International Journal of Advanced Manufacturing Technology. Sep2023, Vol. 128 Issue 3/4, p1029-1048. 20p. 11 Color Photographs, 3 Charts, 9 Graphs.
Databáze: Academic Search Ultimate
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