Effect of ion irradiation during deposition on the structure of alumina thin films grown by plasma assisted chemical vapour deposition.
| Autor: | Kyrylov, O.1, Kurapov, D.1, Schneider, J.M.1 schneider@mch.rwth-aachen.de |
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| Zdroj: | Applied Physics A: Materials Science & Processing. May2005, Vol. 80 Issue 8, p1657-1660. 4p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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