Electrical passivation of stacking-fault crystalline defects in MOS capacitors on cubic silicon carbide (3C-SiC) by post-deposition annealing.

Autor: Fiorenza, P.1 (AUTHOR) patrick.fiorenza@imm.cnr.it, Maiolo, L.2 (AUTHOR), Fortunato, G.2 (AUTHOR), Zielinski, M.3 (AUTHOR), La Via, F.1 (AUTHOR), Giannazzo, F.1 (AUTHOR), Roccaforte, F.1 (AUTHOR)
Zdroj: Journal of Applied Physics. 12/28/2022, Vol. 132 Issue 24, p1-8. 8p.
Databáze: Academic Search Ultimate