The structural and dielectric properties of SiOx/a-C,F/SiOx multi-layer thin films deposited by microwave electron cyclotron resonance plasma method

Autor:	Xin, Y.1 xylzf_1999@263.net, Ning, Z.Y.1, Ye, C.1, Xu, S.H.1, Chen, J.1, Lu, X.H.2
Zdroj:	Thin Solid Films. Jan2005, Vol. 472 Issue 1/2, p44-48. 5p.
Databáze:	Academic Search Ultimate
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect