Three-Dimensional TID Hardening Design for 14 nm Node SOI FinFETs.

Autor: Peng Lu1 lupeng@ime.ac.cn, Can Yang1 yangcan@ime.ac.cn, Yifei Li1 liyifei@ime.ac.cn, Bo Li1 libo3@ime.ac.cn, Zhengsheng Han1 zshan@ime.ac.cn
Zdroj: Eng. Dec2021, Vol. 2 Issue 4, p620-631. 12p.
Databáze: Academic Search Ultimate