Thermal stability and electrical properties of Zr silicate films for high-kgate-dielectric applications, as prepared by pulsed laser deposition.
| Autor: | J. Zhu1, Z. G. Liu1 zgliu@nju.edu.cn, M. Zhu1, G. L. Yuan1, J. M. Liu1 |
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| Zdroj: | Applied Physics A: Materials Science & Processing. 2005, Vol. 80 Issue 2, p321-324. 4p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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