Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold.

Autor: Balogh-Michels, Zoltán1,2 zoltan.balogh@rhysearch.ch, Stevanovic, Igor1, Borzi, Aurelio2, Bächli, Andreas1, Schachtler, Daniel1, Gischkat, Thomas1, Neels, Antonia2, Stuck, Alexander1, Botha, Roelene1
Zdroj: Journal of the European Optical Society. Dec20213/6/2021, Vol. 17 Issue 1, p1-8. 8p.
Databáze: Academic Search Ultimate