Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold.
Autor: | Balogh-Michels, Zoltán1,2 zoltan.balogh@rhysearch.ch, Stevanovic, Igor1, Borzi, Aurelio2, Bächli, Andreas1, Schachtler, Daniel1, Gischkat, Thomas1, Neels, Antonia2, Stuck, Alexander1, Botha, Roelene1 |
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Zdroj: | Journal of the European Optical Society. Dec20213/6/2021, Vol. 17 Issue 1, p1-8. 8p. |
Databáze: | Academic Search Ultimate |
Externí odkaz: |