Effect of IR Irradiation on the Oxidation of Thin Cu–Ti Films on Si Substrates at Reduced Oxygen Pressure.

Autor: Khoviv, A. M.1, Pribytkov, D. M.1, Malevskaya, L. A.1
Zdroj: Inorganic Materials. Oct2004, Vol. 40 Issue 10, p1070-1072. 3p.
Databáze: Academic Search Ultimate