Frustrated Lewis Pair Chelation as a Vehicle for Low‐Temperature Semiconductor Element and Polymer Deposition.

Autor: Omaña, Alvaro A.1 (AUTHOR), Green, Rachel K.1 (AUTHOR), Kobayashi, Ryo2 (AUTHOR), He, Yingjie1 (AUTHOR), Antoniuk, Evan R.1 (AUTHOR), Ferguson, Michael J.1 (AUTHOR), Zhou, Yuqiao1 (AUTHOR), Veinot, Jonathan G. C.1 (AUTHOR), Iwamoto, Takeaki2 (AUTHOR), Brown, Alex1 (AUTHOR), Rivard, Eric1 (AUTHOR) erivard@ualberta.ca
Zdroj: Angewandte Chemie. 1/4/2021, Vol. 133 Issue 1, p230-233. 4p.
Databáze: Academic Search Ultimate
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