An Approach to Realize Deep Submicron Multilevel Interconnection Using Low-Resistance and Low-ε Materials.
| Autor: | Homma, Yoshio1, Kusukawa, Kikuo1, Furusawa, Takeshi1, Kobayashi, Nobuyoshi1 |
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| Zdroj: | Electronics & Communications in Japan, Part 2: Electronics. Oct95, Vol. 78 Issue 10, p52-64. 13p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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