Abatement of Sulfur Hexafluoride Emissions from the Semiconductor Manufacturing Process by Atmospheric-Pressure Plasmas.
| Autor: | How Ming Lee1, Moo Been Chang1 mbchang@ncuen.ncu.edu.tw, Kuan Yu Wu1 |
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| Zdroj: | Journal of the Air & Waste Management Association (Air & Waste Management Association). Aug2004, Vol. 54 Issue 8, p0-970. 11p. 2 Diagrams, 4 Charts, 10 Graphs. |
| Databáze: | Academic Search Ultimate |
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