Exposition time analysis of AlGaN/GaN HEMT fabrication by electron beam lithography.
| Autor: | INDYKIEWICZ, KORNELIA1 kornelia.indykiewicz@pwr.wroc.pl, PASZKIEWICZ, BOGDAN1, PASZKIEWICZ, REGINA1 |
|---|---|
| Zdroj: | Optica Applicata. 2019, Vol. 49 Issue 1, p161-166. 6p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
|