Pulsed Plasmas For Sputtering Applications.

Autor: Sproul, W. D.1 bill.sproul@aei.com, Christie, D. J.1, Carter, D. C.1, Tomasel, F.1, Linz, T.2
Zdroj: Surface Engineering. Jun2004, Vol. 20 Issue 3, p174-176. 3p.
Databáze: Academic Search Ultimate