Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography.
| Autor: | Peng, Xiaoman1, Wang, Yafei1, Xu, Jian1, Yuan, Hua1, Wang, Liangqian1, Zhang, Tao1, Guo, Xudong1, Wang, Shuangqing1 gqyang@iccas.ac.cn, Li, Yi2 yili@mail.ipc.ac.cn, Yang, Guoqiang1 g1704@iccas.ac.cn |
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| Zdroj: | Macromolecular Materials & Engineering. Jun2018, Vol. 303 Issue 6, p1-1. 6p. |
| Databáze: | Academic Search Ultimate |
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