IMMERSION DISPLACEMENT DEPOSITION OF COPPER ON POROUS SILICON FOR NANOSTRUCTURE FABRICATION.

Autor: BANDARENKA, H.1, REDKO, S.1, NENZI, P.2, BALUCANI, M.2
Zdroj: Physics, Chemistry & Applications of Nanostructures: Reviews & Short Notes - Proceedings of International Conference Nanomeeting - 2011. 2011, p404-407. 4p.
Databáze: Academic Search Ultimate