Effect of V 2 O 5 on BaWO 4 thin films deposited by RF sputtering for microwave decorative and dielectric capacitor applications.

Autor:	Kumar, C. Anil1, Pamu, D.1
Zdroj:	Ferroelectrics. 2017, Vol. 518 Issue 1, p171-177. 7p.
Databáze:	Academic Search Ultimate
Externí odkaz:	Zobrazit plný text záznamu