New non-chemically amplified molecular resist design with switchable sensitivity for multi-lithography applications and nanopatterning.
| Autor: | Neha Thakur1,2, Pulikanti Guruprasad Reddy1,2, Santu Nandi1, Midathala Yogesh1, Satinder K Sharma3, Chullikkattil P Pradeep1 pradeep@iitmandi.ac.in, Subrata Ghosh1 subrata@iitmandi.ac.in, Kenneth E Gonsalves1 kenneth@iitmandi.aci.in |
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| Zdroj: | Journal of Micromechanics & Microengineering. Dec2017, Vol. 27 Issue 12, p1-1. 1p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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