Control of nanoparticle size and amount by using the mesh grid and applying DC-bias to the substrate in silane ICP-CVD process.
| Autor: | Yoo, Seung-Wan1, Hwang, Nong-Moon2 nmhwang@snu.ac.kr, You, Shin-Jae1 sjyou@cnu.ac.kr, Kim, Jung-Hyung3, Seong, Dae-Jin3 |
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| Zdroj: | Journal of Nanoparticle Research. Nov2017, Vol. 19 Issue 11, p1-8. 8p. |
| Databáze: | Academic Search Ultimate |
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