Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Ar.
| Autor: | Greczynski, G.1 grzgr@ifm.liu.se, Zhirkov, I.1, Petrov, I.1,2, Greene, J.E.1,2,3, Rosen, J.1 |
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| Zdroj: | Thin Solid Films. Nov2017, Vol. 642, p36-40. 5p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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