Plasma-Assisted Process for Removing NO/NO[sub x] from Gas Streams with C[sub 2]H[sub 4] as Additive.
| Autor: | How Ming Lee1, Moo Been Chang1 mbchang@ncuen.ncu.edu.tw, Shyh Chaur Yang1 |
|---|---|
| Zdroj: | Journal of Environmental Engineering. Sep2003, Vol. 129 Issue 9, p800. 11p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
|