Influence of the surface roughness and oxide surface layer onto Si optical constants measured by the ellipsometry technique.
| Autor: | Rozouvan, T. S.1 tamara_rozouvan@yahoo.ca, Poperenko, L. V.1, Shaykevich, I. A.1 |
|---|---|
| Zdroj: | Semiconductor Physics, Quantum Electronics & Optoelectronics. 2015, Vol. 18 Issue 1, p26-30. 5p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
|