Band alignment and effective work function of atomic-layer deposited VO2 and V2O5 films on SiO2 and Al2O3.

Autor: Cerbu, F.1, Chou, H.-S.1, Radu, I. P.2, Martens, K.2, Peter, A. P.2, Afanas'ev, V. V.1, Stesmans, A.1
Zdroj: Physica Status Solidi (C). Jan2015, Vol. 12 Issue 1/2, p238-241. 4p.
Databáze: Academic Search Ultimate
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