| Autor: |
Suzuki, Katsumasa1 Katsumasa.Suzuki@tn-sanso.co.jp, Ishihara, Yoshio2, Sakoda, Kaoru2, Shirai, Yasuyuki3, Teramoto, Akinobu3, Hirayama, Masaki3, Ohmi, Tadahiro3, Watanabe, Takayuki4, Ito, Takashi5 |
| Předmět: |
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| Zdroj: |
IEEE Transactions on Semiconductor Manufacturing. Nov2008, Vol. 21 Issue 4, p668-675. 8p. 1 Chart, 11 Graphs. |
| Abstrakt: |
In order to minimize contributions to global warming, it is important to develop a perfluorocompound (PFC) abatement system that can remove PFCs effectively with low electric power. We have developed a new PFC abatement system consisting mainly of a 2-MHz ICP plasma source and two Ca(OH)2/CaO columns operated under a decompression pressure. Reactive fluorinated compounds including SiF4 are immobilized in the Ca(OH)2/CaO columns without a water scrubber. Stable compounds such as CF4 are excited by the 2-MHz ICP plasma. When the emissions from an Si oxidation film etching process chamber were treated by this abatement system, F2 equivalent removal efficiency was 99.6%, which was about one order of magnitude larger than that of a conventional abatement system. But the CO2 equivalent removal efficiency was calculated to be 91.4% because over 95% of CO2 equivalent emissions were caused by the plasma source power consumption of 2.4 kWh. It means that minimization of the plasma source power consumption, depending on PFC emissions, is a very effective method of minimizing contributions to global warming in a manner similar to improving the PFC removal efficiency. [ABSTRACT FROM AUTHOR] |
| Databáze: |
GreenFILE |
| Externí odkaz: |
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