A Reliable Dual Supply Single Gate Oxide I/O Driver with High Voltage Tolerant Input Feature Built in a 1.95nm Tox, 65nm CMOS Technology
| Autor: | Hsiu-Wen Lin, 林秀玟 |
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| Rok vydání: | 2007 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 95 |
| Databáze: | Networked Digital Library of Theses & Dissertations |
| Externí odkaz: |
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