Effect of bias and heat treatment on the microstructure and properties of ZrN thin films deposited by Filtered Cathodic Arc Ion-Plating
| Autor: | Hsiao-Ming Tung, 董曉明 |
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| Rok vydání: | 2004 |
| Druh dokumentu: | 學位論文 ; thesis |
| Popis: | 93 Nano-crystalline ZrN films were deposited on Si (100) and AISI 304 stainless steel substrates using Filtered Cathodic Arc Deposition (FCAD) system. The effects of negative substrate bias and thermal treatment were investigated on the composition, structures, properties, and corrosion resistance of the ZrN film. The calculated energy and momentum of ZrN films deposited on 304SS was higher than on Si due to different substrate current density (or flux of ions), resulting in the different microstructure of deposited films. Oxygen atoms were incorporated and distrubed uniformly from the results of XPS and SIMS. After heat treatment, loss of hardness for ZrN/304SS dramatically decreased about 36.1% ~ 46.9%, attributed to the rearrangement of defects in atomic dimension and formation of ZrO2 phase. No significant variation in the hardness of ZrN/Si was observed except B3 specimen because the deposited atoms may have positioned the reqular site. The intrinsic residual stress of the films coated on both substrates were at similar order of magnetude. For ZrN/304SS, the intrinsic residual stress is apparently lowered as a result of recovery of atoms in the films. The results of potentiodynamic polarization scan in the solution of 1N H2SO4 + 0.05M KSCN indicate that Icorr value decreased with heating; however, the Icrit value increased due to the decrease of corrosion resistance of the substrate, connect of pinhole or porosity throughout the film, and the reaction of ZrN and Cr2O3 at interface of ZrN thin film and 304SS substrate. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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