Processing and reliability studies on hafnium oxide and hafnium silicate for the advanced gate dielectric application
| Autor: | Choi, Rino, Lee, Jack Chung-Yeung |
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| Jazyk: | angličtina |
| Rok vydání: | 2004 |
| Předmět: | |
| Popis: | Thesis (Ph. D.)--University of Texas at Austin, 2004. Supervisor: Jack C. Lee. Vita. Includes bibliographical references. |
| Databáze: | Networked Digital Library of Theses & Dissertations |
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