Anisotropic and low damage III-V/Ge heterostructure etching for multijunction solar cell fabrication with passivated sidewalls

Autor: de Lafontaine, Mathieu, Pargon, Erwine, Gay, Guillaume, Petit-Etienne, Camille, David, Sylvain, Barnes, Jean-Paul, Rochat, Névine, Jaouad, Abdelatif, Volatier, Maïté, Fafard, Simon, Aimez, Vincent, Darnon, Maxime
Zdroj: In Micro and Nano Engineering June 2021 11
Databáze: ScienceDirect