Suppression of p-type parasitic channel formation at the interface between the aluminum nitride nucleation layer and the high-resistivity silicon substrate

Autor: Lin, Pojung, Liu, Jiazhe, Lin, Hongche, Chuang, Zhiyuan, Hsu, Wenching, Chen, Yiche, Liu, Poliang, Horng, Rayhua
Zdroj: In Surfaces and Interfaces February 2023 36
Databáze: ScienceDirect