Conformal atomic layer etching for Ge based on sacrificial oxide with higher Gibbs free energy of formation
| Autor: | Ling, Chen-Hsiang, Chou, Chun-Yi, Chung, Tsai-Fu, Shyue, Jing-Jong, Yang, Jer-Ren, Chen, Miin-Jang |
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| Zdroj: | In Surfaces and Interfaces June 2022 30 |
| Databáze: | ScienceDirect |
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