Plasma deposited silicon oxide films for controlled permeation of copper as antimicrobial agent
Autor: | Lehmann, Antje, Rupf, Stefan, Schubert, Andreas, Zylla, Isabella-Maria, Seifert, Hans Jürgen, Schindler, Axel, Arnold, Thomas |
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Zdroj: | In Clinical Plasma Medicine June 2015 3(1):3-9 |
Databáze: | ScienceDirect |
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