Robust ferroelectric and low coercive field in ZrO2 thin film through wide chemical-processing window
| Autor: | Liu, Xiuqiao, Li, Hangren, Zheng, Dongxing, Tu, Jie, Xi, Guoqiang, Liu, Xudong, Wu, Rong, Lu, Dongfei, Wang, Qingxiao, Zhang, Xixiang, Tian, Jianjun, Zhang, Linxing |
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| Zdroj: | In Nano Today December 2024 59 |
| Databáze: | ScienceDirect |
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