Polishing monoclonal antibody using pH-responsive TiO2/polysulfone membrane in dual size-exclusion strategy

Autor: Melvin Ng, H.K., Leo, C.P., Lim, Theam Soon, Low, S.C., Ooi, B.S.
Zdroj: In Separation and Purification Technology 15 April 2019 213:359-367
Databáze: ScienceDirect