A review of silicon carbide CMOS technology for harsh environments

Autor: Wang, Hui, Lai, Pengyu, Islam, Md Zahidul, Hasan, Abu Shahir Md Khalid, Di Mauro, Anthony, Anika, Nur-E-Afra, Russell, Robert, Feng, Zhuowen, Chen, Kevin, Faruque, Asif, White, Thomas, Chen, Zhong, Mantooth, H. Alan
Zdroj: In Materials Science in Semiconductor Processing 1 August 2024 178
Databáze: ScienceDirect