Ultrafast hot-electron injection at HfN-metal oxide heterojunctions: Role of barrier height

Autor: Singh, Ranveer, Sial, Qadeer Akbar, Kim, Unjeong, Nah, Sanghee, Seo, Hyungtak
Zdroj: In Materials Science in Semiconductor Processing December 2022 152
Databáze: ScienceDirect