Simultaneous diffusion of Si and Ge in isotopically controlled [formula omitted] heterostructures
| Autor: | Kube, R., Bracht, H., Lundsgaard Hansen, J., Nylandsted Larsen, A., Haller, E.E., Paul, S., Lerch, W. |
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| Zdroj: | In Materials Science in Semiconductor Processing 2008 11(5):378-383 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect