Process integration of infrared-sensitive PIN photodiodes and CMOS transistors in a single-SiGe substrate
| Autor: | Nebrich, L. *, Neumeier, K., Stadler, A., Weber, J., Bensch, F., Kreuzer, S., Vogg, G., Herrmann, K., Klumpp, A., Wieland, R., Bonfert, D., Soldner, W., Ramm, P. |
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| Zdroj: | In Materials Science in Semiconductor Processing 2005 8(1):429-433 |
| Databáze: | ScienceDirect |
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