Application of Ru-based gate materials for CMOS technology
| Autor: | T˘apajna, M. *, Písec˘ny, P., Lupták, R., Hus˘eková, K., Fröhlich, K., Harmatha, L., Hooker, J.C., Roozeboom, F., Jergel, J. |
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| Zdroj: | In Materials Science in Semiconductor Processing 2004 7(4):271-276 |
| Databáze: | ScienceDirect |
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