The contribution of 180° domain wall motion to dielectric properties quantified from in situ X-ray diffraction

Autor: Fancher, C.M., Brewer, S., Chung, C.C., Röhrig, S., Rojac, T., Esteves, G., Deluca, M., Bassiri-Gharb, N., Jones, J.L.
Zdroj: In Acta Materialia March 2017 126:36-43
Databáze: ScienceDirect