Ferroelectric La-doped HfO2 deposited via chemical solution on silicon for tellurium field-effect phototransistors
| Autor: | Jeong, Uisik, Rho, Hyun Yeol, Cho, Haewon, Naqi, Muhammad, Oh, Joo On, Cho, Yongin, Pujar, Pavan, Kim, Sunkook |
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| Zdroj: | In Journal of Alloys and Compounds 15 December 2023 968 |
| Databáze: | ScienceDirect |
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