Atomic layer deposited Mo2N thin films using Mo(CO)6 and NH3 plasma as a Cu diffusion barrier
| Autor: | Joo, Yong-Hwan, Nandi, Dip K., Ramesh, Rahul, Jang, Yujin, Bae, Jong-Seong, Cheon, Taehoon, Kim, Soo-Hyun |
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| Zdroj: | In Journal of Alloys and Compounds 25 March 2021 858 |
| Databáze: | ScienceDirect |
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